Integrated circuit chip having anti-moisture-absorption film at edge thereof and method of forming anti-moisture-absorption film

ABSTRACT

An integrated circuit chip having an anti-moisture-absorption film at the edge thereof and a method of forming the anti-moisture-absorption film are provided. In the integrated circuit chip which has predetermined devices inside and whose uppermost layer is covered with a passivation film, a trench is formed by etching interlayer dielectric films to a predetermined depth along the perimeter of the integrated circuit chip to be adjacent to the edge of the integrated circuit chip and an anti-moisture-absorption film is formed to fill the trench or is formed on the sidewall of the trench to a predetermined thickness, in order to prevent moisture from seeping into the edge of the integrated circuit chip. Moisture is effectively prevented from seeping into the edge of the chip by forming the anti-moisture-absorption film at the edge of the chip using the conventional processes of manufacturing the integrated circuit chip without an additional process.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to an integrated circuit chip and a methodof manufacturing the same, and more particularly, to a structure at theedge of an integrated circuit chip and a method of forming the same.

2. Description of the Related Art

A plurality of integrated circuit chips are generally simultaneouslyformed on one wafer. The completed chips are sawed one by one and arepackaged. Referring to FIG. 1 which is a plan view showing part of thesurface of a wafer on which a plurality of integrated circuit chips areformed, chips 10 are formed on the wafer at predetermined intervalsusing the same process. The chips 10 are separated from each other byscribe lines 20 which define spaces for sawing the chips 10.

Referring to FIG. 2 which is an enlarged sectional view taken along theline 2—2 of FIG. 1, metal interconnections 40 and a contact 60 areformed in the chip 10. Interlayer dielectric films 30 are interposedbetween the metal interconnections 40. The uppermost part is coveredwith a passivation film 50. Also, since the area occupied by the scribelines 20 is not generally used as a device, only interlayer dielectricfilms 30 and a passivation film 50 exist. However predetermined circuitpatterns 45 referred to as a test element group (TEG) may be formed inorder to estimate the characteristics of a device which is beingdesigned in advance. Also, trenches 70 are formed at the boundaries ofthe chips 10 and the scribe lines 20. This is for cutting thepassivation film 50, since mechanical shock generated when the chips aresawed along the center of the scribe line 20 and separated from eachother is transmitted to the chip 10 through the passivation film 50formed of silicon nitride, which is a hard material, The shock is strongif there is no trench 70, thus causing cracks to occur in thepassivation film 50 and the device under the passivation film 50 of thechip 10. The trench 70 is formed in an etching process also used to forma fuse opening (not shown) of the chip 10 without in order to reduce thenumber of processes. The wafer is sawed along the center of the scribeline 20 and divided into separate chips. In FIG, 2, the part betweendotted lines 80 is sawed and removed. The entire width of the scribeline 20 is generally between about 100 and 120 μm. The width of thesawed and removed part (the part between dotted lines 80) is generallybetween about 30 and 60 μm.

In general, before the completed chips 10 are sawed, the reliability ofthe wafer shown in FIG. 2 is tested at a temperature of between 100 and150° C., a humidity of between 80 and 100%, and a pressure of between1.5 and 3 atm, in order to estimate whether the completed integratedcircuit chips operate in a stable condition at a high temperature, ahigh humidity, and a high pressure.

The interlayer dielectric films 30 exposed on the sidewalls of thetrenches 70 located at the edges of the chips 10 are usually formed ofsilicon oxide such as boron phosphorous silicate glass (BPSG),phosphorous silicate glass (PSG), spin on glass (SOG), tetra ethyl orthosilicate (TEOS), and undoped silicate glass (USG), which have anexcellent planarization characteristic. However, the BPSG, the PSG, theSOG, and the TEOS, which include a high concentration of impurities suchas boron greater than or equal to 5 weight % and phosphorous greaterthan or equal to 4 weight %, are vulnerable to moisture. Furthermore, inorder to prevent changes in the characteristics of the device, theinterlayer dielectric films 30 are formed at a low temperature.Therefore, when moisture seeps into interfaces between the interlayerdielectric films 30 vulnerable to moisture while test the reliability ofthe device, the metal interconnections 40 formed of tungsten or aluminumand the contact 60 in an adjacent peripheral circuit erode and theinterfaces between the interlayer dielectric films 30 or the interfacesbetween the interlayer dielectric films 30 and the metalinterconnections 40 are peeled from each other, or cracks occur in theinterfaces between the interlayer dielectric films 30 or the interfacesbetween the interlayer dielectric films 30 and the metalinterconnections 40. Accordingly, the reliability of the device severelydeteriorates.

Similar problems occur in the fuse opening (not shown) in the chip 10.In order to solve the problems in the fuse opening, a method of formingan anti-moisture-absorption film with a moisture-proof material on thesidewall of the fuse opening (U.S. Pat. No. 5,879,966) and a method offorming a ring-shaped guard ring which surrounds the fuse opening(Japanese Patent Publication No. Hei 9-69571) are provided. However,when using these methods, it is necessary to add process steps. Also,such methods have not been provided with respect to the edges of thechips.

SUMMARY OF THE INVENTION

To solve the above problem, it is an object of the present invention toprovide an integrated circuit chip having a structure capable ofpreventing moisture from seeping into the edge of the chip.

It is another object of the present invention to provide a method offorming an anti-moisture-absorption film capable of preventing moisturefrom seeping into the edge of a chip without an additional process.

In accordance with the present invention, an integrated circuit chip isprovided with a plurality of devices formed in the integrated circuitchip. A passivation film is formed on the integrated circuit chip. Atrench is formed at a predetermined depth along the perimeter of theintegrated circuit chip adjacent to the edge of the integrated circuitchip. An anti-moisture-absorption film is formed in the trench at apredetermined thickness. The anti-moisture-absorption film preventsmoisture from seeping into the edge of the integrated circuit chip.

The trench can be formed by etching interlayer dielectric films of thedevice to the predetermined depth. The anti-moisture-absorption film canbe formed on a sidewall of the trench.

The anti-moisture-absorption film can be formed by extending thepassivation film at least to the sidewall of the trench.

The anti-moisture-absorption film may comprise a conductive layerpattern which fills the trench or is formed on the sidewall of thetrench to a predetermined thickness and a passivation film extended soas to cover the conductive layer pattern.

In accordance with the invention, there is also provided a method offorming an anti-moisture-absorption film at a boundary between anintegrated circuit chip and a scribe line, in a wafer on which aplurality of integrated circuit chips are formed by interposing thescribe line. In the method of forming the anti-moisture-absorption film,predetermined devices, a lower interconnection layer, and an insulatinglayer on the lower interconnection layer are formed in an area where thechips are formed by sequentially stacking predetermined material layerand interlayer dielectric films on the wafer. A contact hole whichexposes the lower interconnection layer is formed in a predeterminedposition of the chip by etching the insulating layer on the lowerinterconnection layer, and a trench is formed to a predetermined depthby etching interlayer dielectric films stacked at the boundary betweenthe chip and the scribe line at the same time. After forming aconductive layer by depositing a conductive material which will form anupper interconnection layer of the integrated circuit chip on the entiresurface of the wafer on which the contact bole and the trench areformed, the upper interconnection layer and a contact are formed in thechip by patterning the conductive layer and the conductive material isremoved inside and around the trench at the same time. The passivationfilm is formed by depositing a moisture-proof material on the entiresurface of the wafer on which the upper interconnection layer is formed.The anti-moisture-absorption film is formed with the passivation filmformed inside the trench by removing part of the passivation film at theboundary between the chip and the scribe line.

According to one embodiment of the present invention, ananti-moisture-absorption film is formed with a conductive material filmleft on the sidewall of the trench or inside the trench when theconductive material layer, which will form the upper interconnectionlayer, is patterned and the passivation film on the conductive materiallayer.

In one embodiment, an etching stop film is formed under the lowerinterconnection layer by extending a predetermined material layer whichforms the device of the integrated circuit chip having etchingselectivity with respect to interlayer dielectric films to be etched inorder to form the trench before forming the lower interconnection layerand the interlayer dielectric films are etched until the etching stopfilm is exposed, so that the trench can be formed.

According to the present invention, moisture is prevented from seepinginto the edge of a chip by forming an anti-moisture-absorption film onthe sidewall of a trench formed at the edge of an integrated circuitchip or inside the trench.

BRIEF DESCRIPTION OF THE DRAWINGS

The foregoing and other objects, features and advantages of theinvention will be apparent from the following more particulardescription of preferred embodiments of the invention, as illustrated inthe accompanying drawings in which like reference characters refer tothe same parts throughout the different views. The drawings are notnecessarily to scale emphasis instead being placed upon illustrating theprinciples of the invention.

FIG. 1 is a plan view showing part of the surface of a wafer on which aplurality of integrated circuit chips are formed.

FIG. 2 is an enlarged sectional view taken along the line 2—2 of FIG. 1.

FIGS. 3A through 3F are sectional views showing processes of forming ananti-moisture-absorption film at the edge of an integrated circuit chipaccording to an embodiment of the present invention and the structure ofthe chip edge formed thereby.

FIGS. 4A through 4C are sectional views showing a structure in which ananti-moisture-absorption film is formed at the edge of an integratedcircuit chip according to another embodiment of the present invention.

FIGS. 5A through 5F are sectional views showing processes of forming ananti-moisture-absorption film at the edge of an integrated circuit chipaccording to still another embodiment of the present invention and thestructure of the chip edge formed thereby.

FIGS. 6A through 6C are sectional views showing a structure in which theanti-moisture-absorption film is formed at the edge of the integratedcircuit chip according to still another embodiment of the presentinvention.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

The present invention now will be described more fully with reference tothe accompanying drawings, in which preferred embodiments of theinvention are shown. In the drawings, it will also be understood thatwhen a layer is referred to as being on another layer or substrate, itcan be directly on the other layer or substrate, or intervening layersmay also be present. Also, each of interlayer dielectric films isdescribed to have a single-layered structure, however, can have astructure where multi-layered interlayer dielectric films are stacked.The thickness or length of layers are exaggerated for clarity.

FIGS. 3A through 3F are sectional views showing processes of forming ananti-moisture-absorption film at the edge of an integrated circuit chipaccording to an embodiment of the present invention and the structure ofthe chip edge formed thereby. Chip areas and scribe lines of only oneside are shown in FIGS. 3A through 3F unlike in FIG. 2. The chip areasand the scribe lines of only one side are shown in other embodiments.

Referring to FIG. 3A, a trench is formed at the boundary between a chipand a scribe line. Material layer patterns 110 which form apredetermined device are formed in the chip on a substrate or aninterlayer dielectric film 100. Predetermined material layer patterns112 can be simultaneously formed in the scribe line for a test elementgroup (TEG). Here, since the characteristic part of the presentinvention is the boundary between the chip and the scribe line, adetailed description of a device or material layer patterns formedinside the chip and in the center of the scribe line excluding theboundary will be omitted. In the case of a memory device, the respectivememory cells and a peripheral circuit for driving the respective memorycells are generally formed inside the chip.

After forming an interlayer dielectric film 120, a lower interconnectionlayer 130 of the chip is formed. The lower interconnection layer 130 isformed by depositing a conductive material, for example, a metal such astungsten or aluminum, on the entire surface of the interlayer dielectricfilm 120 (a barrier metal layer may be included under a metal layer whenthe metal is used) and patterning the metal in a desired interconnectionpattern.

A contact hole 150 is formed by depositing an interlayer dielectric film140 such as a silicon oxide film on the entire surface of the resultanton the lower interconnection layer 130 to a thickness of between 5,000and 10,000 Å and by etching the interlayer dielectric film 140 in aportion where a contact is to be formed. A trench 152 is simultaneouslyformed at the boundary between the chip and the scribe line. To bespecific, the contact hole 150 which exposes the lower interconnectionlayer 130 is formed in the chip, and the trench 152 is formed at theboundary between the chip and the scribe line at the same time byforming a photoresist pattern (not shown) which exposes the portions ofthe interlayer dielectric film 140 to be etched and plasma etching theinterlayer dielectric film 140 formed of the silicon oxide using CF₄having a flow rate of between 35 and 50 sccm and CHF₃ having a flow rateof between 35 and 50 sccm as etching gases, and flowing Ar having a flowrate of between 300 and 450 sccm, at a pressure of between 300 and 500mTorr, and at an RF power of between 1,100 and 1,400 W, for between 100and 150 seconds. The width of the trench 152 is about several μm.

A conductive material layer 160 which fills the contact hole 150 isformed and the conductive material layer 160 is also formed in thetrench 152, as shown in FIG. 3B, when the conductive material, forexample, a metal such as tungsten or aluminum, is deposited on theentire surface of the resultant of FIG. 3A to a thickness of between6,500 and 10,000 Å in order to form an upper interconnection layer onthe entire surface of the resultant structure.

Referring to FIG. 3C, the conductive material layer 160 is patterned. Asa result, an upper interconnection layer 164 including a contact isformed in the chip and the conductive material is completely removedinside and around the trench 152. At this time, an interconnectionpattern 162 can be formed in the scribe line, if necessary.

Referring to FIG. 3D, a passivation film 170 used as theanti-moisture-absorption film is formed on the uppermost layer of thechip and the sidewall of the trench 152. The interlayer dielectric film120 is exposed in the center of the bottom of the trench 152, since partof the passivation film 170 is removed.

In order to form the structure shown in FIG. 3D, a moisture-proof filmsuch as a silicon nitride film, a silicon oxide film which is not dopedwith impurities or is doped with a low concentration of impurities, or acompound film of the above films is formed on the entire surface of theresultant structure of FIG. 3C. In the present embodiment, the siliconoxide film which is not doped with impurities is deposited to athickness of between 1,000 and 2,000 Å. The silicon nitride film isdeposited on the silicon oxide film to a thickness of between 5,000 and10,000 Å. As a result, an interface between the interlayer dielectricfilms 120 and 140, which is exposed on the sidewall of the trench 152and can be a moisture-absorption path, is covered with the passivationfilm 170. Accordingly, the moisture-absorption path is blocked by thepassivation film 170.

A chip edge structure is completed by removing part of the passivationfilm 170, thus exposing the interlayer dielectric film 120 so thatmechanical shock is not transmitted through the passivation film 170when the wafer is sawed along the center of the scribe line. Theinterlayer dielectric film 120 is exposed at the bottom of the trench152 in a process of exposing the upper interconnection layer 164 byetching the passivation film 170 in order to form a bonding pad (notshown) for wire bonding, so that an additional process is not needed.The interlayer dielectric film 120 is exposed in the center of thetrench 152 and the bonding pad (not shown) in which the upperinterconnection layer 164 is exposed is formed in a predeterminedposition of the chip by performing a photolithography process. To bespecific, a photoresist pattern (not shown) is formed to expose aportion in which the bonding pad is to be formed and the center of thetrench 152, and the passivation film 170 formed by stacking the siliconoxide film and the silicon nitride film is plasma etched using CF₄having a flow rate of between 65 and 90 sccm and O₂ having a flow rateof between 10 and 25 sccm as etching gases, and flowing Ar having a flowrate of between 80 and 110 sccm, at a pressure of between 300 and 500mTorr, and at an RF power of between 1,000 and 1,300 W, for between 60and 95 seconds.

When the reliability of the integrated circuit chip is tested at a hightemperature, a high humidity, and a high pressure in the state that theanti-moisture-absorption film is formed of the passivation film 170 onthe sidewall of the trench 152, moisture is prevented from seeping intothe sidewall of the trench formed at the boundary between the chip andthe scribe line, unlike in the conventional technology. Accordingly,reliable integrated circuit chips are obtained.

When the chips are sawed along the center of the scribe lines after thereliability of the integrated circuit chips tested, the right side of adotted line 200 is cut and removed and the chip on the left side of thedotted line 200 is divided into separate chips.

FIG. 3E is a modification of the present embodiment. The position wherepart of a passivation film 172 is removed in FIG. 3E is different fromthe position where part of the passivation film 170 is removed in FIG.3D. Meanwhile it is probable that a small amount of moisture will seepinto the interface between the interlayer dielectric film 120 exposed tothe bottom of the trench 152 and the passivation film 170 in thestructure shown in FIG. 3D. However, the seeping of moisture iscompletely prevented in the structure shown in FIG. 3E.

FIG. 3F is another modification of the present invention, in which apassivation film 174 fills a trench 154. Here, the width of the trench154 is formed to be equal to or less than twice the thickness of thepassivation film 174 so that the passivation film 174 fills the trench154. In the structure shown in FIG. 3F, it is possible to completelyprevent the seeping of moisture like in the structure shown in FIG. 3E.

FIGS. 4A through 4C are sectional views showing the structure of theedge of a chip according to another embodiment of the present invention.Conductive material patterns 166, 167, and 168 which are formed of thesame material as the upper interconnection layer 164 in the chip areleft inside the trench or on the sidewall of the trench in the presentembodiment, unlike in the embodiment described above in connection withFIGS. 3A through 3F.

In order to form the structure shown in FIG. 4A, in the stepcorresponding to FIG. 3C of the embodiment of FIGS. 3A through 3F, theconductive material is not completely removed inside and around thetrench 156 when the upper interconnection layer 164 is formed and isleft on the sidewall of the trench 156. The structure shown in FIG. 4Ais obtained through the same process as the embodiment of FIGS. 3Athrough 3F described with reference to FIG. 3D. The width of the trench156 is made wider than the width of the trench 152 shown in FIG. 3A,considering the thickness of the conductive material pattern 166 left onthe sidewall of the trench 156.

The edge of the chip having the structure shown in FIG. 4B is amodification of the present embodiment, in which the conductive materialpattern 167 is left on the sidewall and the bottom of the trench 156.The part of the passivation film 172 is removed in a portion on thescribe line side adjacent to the trench 156.

The structure shown in FIG. 4C is another modification of the presentembodiment, in which the conductive material pattern 168 fills thetrench 154. In order to form the edge of the chip having the structureshown in FIG. 4C, after the width of the trench 154 is formed to beequal to or less than twice the thickness of the conductive materiallayer 168 so that the conductive material layer 168 fills the trench154, the conductive material layer 168 which fills the trench 154 isleft when the upper interconnection layer 164 of the chip is formed,like in the structure shown in FIG. 3F of the embodiment of FIGS. 3Athrough 3F.

In FIGS. 4A through 4C, the upper interconnection layer 164 is describedas being separated from the conductive material patterns 166, 167, and168 left on the sidewalls of the trench 156 or inside the trench 154.However, the upper interconnection layer 164 does not need to beseparated from the conductive material patterns 166, 167, and 168 unlessthere is an electrical influence such that the conductive materialpatterns 166, 167, and 168 on the sidewalls of the trenches or insidethe trenches are connected to other elements. This is true of theembodiment of FIGS. 6A through 6C described below in detail.

In the present embodiment, it is possible to prevent moisture fromseeping into the edge of the chip since the interface between theinterlayer dielectric films 120 and 140 which becomes themoisture-absorption path is not exposed.

FIGS. 5A through 5F are sectional views showing processes of forming theanti-moisture-absorption film at the edge of the chip according to athird embodiment of the present invention and the structure of the chipedge formed thereby. The third embodiment is different from the firstembodiment of FIGS. 3A through 3F only in that an etching stop film isformed with a predetermined material layer 190 which forms a device inthe chip under the lower interconnection layer 130, so as to easilycontrol the depth to which the interlayer dielectric films 140 and 122are etched in order to form the trench 152.

Referring to FIG. 5A, the material layer patterns 110 which form apredetermined device are formed on the substrate or the interlayerdielectric film 100 and the interlayer dielectric film 120 is formed onthe material layer pattern 110, like in FIG. 3A. The predeterminedmaterial layer 190 which forms the device in the chip is formed on theinterlayer dielectric film 120 to be extended to the scribe line. Thematerial layer 190 can be formed of polycrystalline silicon which isdoped with impurities, which forms the upper electrode of a memory cellcapacitor when the device formed in the chip is a DRAM device. Thematerial layer 190 can be formed of other interconnections and amaterial having etching selectivity with respect to the interlayerdielectric films 122 and 140 which is generally formed of the siliconoxide thereon. It is not necessary that the material layer 190 must beformed of the conductive material.

After forming the lower interconnection layer 130 by interposing theinterlayer dielectric film 122 on the material layer 190 which willbecome the etching stop film and forming the interlayer dielectric film140 on the lower interconnection layer 130, the trench 152 is formedtogether with the contact hole 150 of the chip and at the boundarybetween the chip and the scribe line as described in FIG. 3A. Thecontact hole 150 and the trench 152 are etched to have different depths,however, they can be simultaneously formed by etching until both thelower interconnection layer 130 and the etching stop film 190 areexposed. Therefore, it is possible to etch the trench 152 to a uniformdepth.

As shown in FIG. 5B, the conductive material layer 160 is formed bydepositing the conductive material which will form the upperinterconnection layer of the chip on the entire surface of the resultantof FIG. 5A.

As shown in FIG. 5C, a predetermined interconnection pattern 162 in thescribe line and in the upper interconnection layer 164 of the chip areformed by patterning the conductive material layer 160, and theconductive material is completely removed inside and around the trench152. Also, the material layer 190 exposed by removing the conductivematerial in the trench 152 is removed. Here, the conductive materiallayer 160 and the material layer 190 exposed at the bottom of the trench152 can be removed by two-step etching using an etching gas or anetching solution. However, it is convenient to remove the conductivematerial layer 160 and the material layer 190 used as the etching stopfilm by successively etching the conductive material layer 160 and thematerial layer 190 using an etching gas or etching solution having lowetching selectivity with respect to the two materials which form theconductive material layer 160 and the material layer 190. Namely, whenthe conductive material layer 160 and the material layer 190 are formedof aluminum and polycrystalline silicon, respectively, polycrystallinesilicon reacts with aluminum due to heat generated when aluminum isdeposited and reflown, thus being metalized (it is possible to observeby a scanning electron microscope that polycrystalline silicon ismetalized). Therefore, metalized polycrystalline silicon is removed byplasma etching aluminum using BCl₃ having a flow rate of between 35 and60 sccm and Cl₂ having a flow rate of between 30 and 50 sccm as etchinggases, and flowing N₂ having a flow rate of between 10 and 25 sccm, andat a pressure of between 100 and 250 mTorr, an RF power of between 300and 700 W, for between 100 and 160 seconds.

Meanwhile, the exposed material layer 190 which was used as the etchingstop film may not be removed, so that it remains on the bottom of thetrench 152, unless there is an influence to other elements, as in theembodiment of FIGS. 6A through 6C described below in detail.

The structure shown in FIG. 5D is obtained through the process describedwith reference to FIG. 3D.

The edge of the chip and the anti-moisture-absorption film having thestructures shown in FIGS. 5E and 5F are modifications of the presentembodiment. A description of the modifications will be omitted since themodifications are different from the modifications described withreference to FIGS. 3E and 3F only in that the material layer 190 used asthe etching stop film (which is etched later and comes to have the formdenoted by reference numeral 192) is used.

According to the present embodiment, it is possible to prevent moisturefrom seeping into the edge of the chip since theanti-moisture-absorption film is formed at the edge of the chip and toeasily control the depth to which the trench is etched in the process offorming the anti-moisture-absorption film.

FIGS. 6A through 6C are sectional views showing the structures of theedge of the chip and the anti-moisture-absorption film according to afourth embodiment of the present invention. The structure of the presentembodiment is obtained by combining the structure of the secondembodiment of FIGS. 4A through 4C with the structure of the thirdembodiment of FIGS. 5A through 5F. The etching stop film 190 is usedduring the etching of the trench and the conductive material patterns166, 167, and 168 which are formed of the same material as the upperinterconnection layer 164 in the chip are left inside the trenches 156and 154. Since the method of forming the edge of the chip according tothe present embodiment is obtained by combining the method of the secondembodiment of FIGS. 4A through 4C with the method of the thirdembodiment of FIGS. 5A through 5F in which the etching stop film 190 isused, a description thereof will be omitted.

As mentioned above, according to the present invention, reliableintegrated circuit chips are obtained by preventing moisture fromseeping into the edges of the chips when the reliability of theintegrated circuit chips are tested. In particular, according to thepresent invention, the anti-moisture-absorption film is formed at theedge of the chip using conventional process steps used in manufacturingintegrated circuit chips without an additional process.

While this invention has been particularly shown and described withreference to preferred embodiments thereof, it will be understood bythose skilled in the art that various changes in form and details may bemade therein without departing from the spirit and scope of theinvention as defined by the appended claims.

What is claimed is:
 1. An integrated circuit device, comprising: anintegrated circuit chip; a plurality of devices formed in the integratedcircuit chip; a scribe line formed at and defining the perimeter of theintegrated circuit chip, said scribe line being used in separating theintegrated circuit chip from other integrated circuit chips; apassivation film formed on the integrated circuit chip; a trench at apredetermined depth along the perimeter of the integrated circuit chipadjacent to the edge of the integrated circuit chip, the trench beingformed at the scribe line at the perimeter of the integrated circuitchip, the predetermined depth being such that a boundary betweenmultiple layers interlayer dielectric films of the integrated circuitdevice intersects a sidewall of the trench; and an etching stop filmformed under at least one of said multiple interlayer dielectric films,such that the bottom of said trench corresponding to said predetermineddepth is formed within said one of said multiple interlayer dielectricfilms; and an anti-moisture-absorption film in the trench at apredetermined thickness, said anti-moisture-absorption film covering theboundary between the multiple layers interlayer dielectric films suchthat moisture is prevented from seeping into the edge of the integratedcircuit chip.
 2. The integrated circuit device of claim 1, wherein theanti-moisture-absorption film is formed on the sidewall of the trench.3. The integrated circuit device of claim 1, wherein the trench isetched into at least one interlayer dielectric film of the integratedcircuit chip.
 4. The integrated circuit device of claim 1 9, wherein theanti-moisture-absorption film is formed by extending the passivationfilm at least to a sidewall of the trench.
 5. The integrated circuitdevice of claim 1, wherein the anti-moisture-absorption film comprises aconductive layer pattern which fills the trench to a predeterminedthickness and a passivation film extended so as to cover the conductivelayer pattern.
 6. The integrated circuit device of claim 5, wherein theconductive pattern is formed of the same material as an uppermostinterconnection layer of the integrated circuit chip.
 7. The integratedcircuit device of claim 1, wherein the anti-moisture-absorption filmcomprises a conductive layer pattern which is formed on the sidewall ofthe trench to a predetermined thickness and a passivation film extendedso as to cover the conductive layer pattern.
 8. The integrated circuitdevice of claim 1, wherein the anti-moisture absorption film comprises aconductive anti-moisture absorption film.
 9. The integrated circuitdevice of claim 1, wherein the anti-moisture absorption film comprisesan insulative anti-moisture absorption film.